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CCT Indium Phosphide Wafer Specification
2-3英寸单δ掺杂PHEMT

外延层 厚度 掺杂 浓度
n+GaAs帽层
500Å
Si
1.0-5.0×1018cm-3
AlxGa1-xAs势垒层
250-500Å
00
Siδ掺杂
0
Si
4.0×1012cm-2
AlxGa1-xAs空间层
20-50Å
0
InxGa1-xAs沟道层
100-170Å
0
GaAs缓冲层
5000Å
0
超晶格缓冲层
1000Å
0
GaAs衬底
625±25μm
0

参数 测试技术 数值
误差
Al摩尔比 XRD 0.20-0.28
±0.01
In摩尔比 XRD 0.15-0.25
±0.01
霍尔迁移率(cm2/V·sec) Hall/Van der Pauw 6300-7500
0
霍尔载流子浓度(cm-2) Hall/Van der Pauw 1.5-2.5×1012
0

Dopant Diameter
(mm)
Type Concentration
(cm-3)
Mobility
(cm2/V.s)
Resistivity
(W.cm)
EPD
(cm-2)
Undoped
50
N
(0.8-2)´1016
(3.5- 4) ´103
0
<(5-6)´104
Sulphur
50
N

(0.8-3)´1018
(4-6)´1018

(2.0-2.4) ´103
(1.3-1.6) ´103

0

<5´104

5´103

76
N

(0.8-3)´1018
(4-6)´1018

(2.0-2.4) ´103
(1.3-1.6) ´103

0

<1´105

<5´104

Zinc
50
P

(0.6-2) ´1018
(3-6)´1018

70-90
50-70

0

<5´104

5´103

Fe
50
N
107-108
>2000
107-108
<5´104
76
N
107-108
>1000
107-108
<2´105
Poly-InP
5070
N
(0.6-5)´1016
0
0
0
One side polishedorientation(100,thickness:350µm (2 inch),625µm(3inch).
Other special requirements can be satisfied.
 
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